Nemo stanford snf. html>fm

Contact snf-access@stanford. The Plasmaetch PE-50 is located in Venice, and is used primarily for surface treatment, for example with PDMS. 3 Equipment Training Lab Organization, Location, and NEMO Information. Lab Organization: Asylum AFM MFP-3D is a fully-featured atomic force microscopy system. Feb 1, 2024 · Our Mission: The SNF is a shared lab, and more We enable a vibrant, diverse community of researchers who make stuff to better understand and improve the world, by cultivating an environment for innovation and a safe place to explore it. 5 Other Lab Policies; 2 Getting Around. Allen Building 420 Via Palou Mall Mail Code 4070 Stanford, CA 94305-4114. 2. Welcome to the SNF Lab User Guide! This is a work-in-progress. MVD is a molecular vapor deposition (MVD) system. NEMO: FEB 1 2024! Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom) SNF Cleanroom Paul G Allen L107 . 2 For Successful Experiments 2. Feb 1, 2024 · Non-Stanford researchers must abide by the terms and conditions of the SNF Service Center Agreement Forms. No solvents! Wet Bench Resist Strip wbresstrip-1 : Wet Bench Resist Strip: Clean (Ge), Semiclean, Flexible: SNF Cleanroom Paul G Allen L107 : Wet Resist Removal: SRS-100 or PRS1000 The KLA AlphaStep D-300 is a stylus-based surface profiler to measure step heights of surfaces. 5cm. N2 annealing available. It can accommodate a variety of small-to-medium size samples that do not exceed ~5-6 mm in height. The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm * wafer cassette processing capability. 5x14. GaAs allowed in personal labware only. Glovebox-r (glovebox-r) | Stanford Nanofabrication Facility The Thinky AR-100 is a non-vacuum planetary centrifugal mixer. Feb 1, 2024 · EE 17N: Engineering the Micro and Nano Worlds: From Chips to Genes. Capable of cutting silicon, glass, quartz, Sapphire, and III-V substrates up to 8" circles. For Shipping & Receiving: Stanford Nanofabrication Facility Paul G. NanoFab01 serves as an online course and resource which contains materials to prepare researchers to become effective lab members of the nano@stanford’s facilities, as well as to be useful to anyone wanting to learn about nanofabrication and Feb 1, 2024 · And some labs require additional training for hazards specific to those labs. For more info, contact a staffer. Phone. , contact aligners, direct write systems, and a ASML i-Line stepper) Deposition systems (e. , MOCVD, ALD, doping equipment, and metallization equipment) Senior Process Operations Engineer, Stanford Nanofabrication Facility. Use calculator to determine growth rate. The origins of the facility that is now known as SNF date back to 1986. 1. edu: Sara Ostrowski: Associate Director of nano@stanford - AFM : Paul G. 1 Labmembership; 1. The extruder allows you to create test pieces from the preselected molds. Allen 140C (650)736-4898 : quynhdng@stanford. edu: Quynh D Nguyen: Financial Accountant : Paul G. ewing@stanford. In cases where your structure may be damaged by standard drying techniques, the CPD (Critical Point Dryer) may be useful. Allen 140D A step-by-step procedure for cleaning the Aixtron BM in the SNF is documented. Manual solvent cleaning of substrates or masks. NEMO Area: Please send an email to all-litho-training For more than 300nm deposition, please contact Graham Ewing<grahamj. Electrons are the usual minority carries in a p-doped semiconductor and holes are the usual minority carriers in n-doped semiconductors. They are not SNF employees, but are SNF labmembers in good standing. The capability of this tool: The capability of this tool: Feb 1, 2024 · Stanford University and Affiliates: The applicable overhead depends on the type of account; the University does not issue invoices for internal accounts and automatically applies the appropriate overhead. Stanford Nanofabrication Facility. The system is in the Flexible cleanliness category and allows a limited subset of gold contaminated substrates. The SNF Cleanroom is a 10,000 square foot facility that is housed in the Paul G. Fumehood 4 is used primarily for PDMS processing including mixing, spin coating, and use of the hot plate. General lab safety hazards are communicated through this SNF Labuser guide and The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma enabled atomic layer deposition system for deposition of restricted oxide films. 1 General Policies. The NNCI is a consortium of 16 university, shared-use facilities which continue the legacy of the users' network by providing micro- and nano- R&D resources to all The Nanometrics Nanospec 210XP system uses non-contact, spectro-reflectometry (measurement of the intensity of reflective light as a function of incident wavelength) to determine the thickness of transparent films (up to two) on substrates, such as silicon, that are reflective in the visible range. edu: Christina Newcomb: AFM Lab Manager : McCullough 236 (650)644-5976 : cnewcomb@stanford. (link is external) Role. ) educate and inform labmembers of safety hazards and response procedures in the lab; b. 1 Communications; 2. , highest point – lowest point on substrate in the Z direction), Special situations - Whether you are planning to tape the substrate to another substrate etc Stanford Nanofabrication Facility Paul G. More than a lab, it's a vibrant research community. It has a 250mW, 405nm laser with a spot size of about 140 microns. CMP is often used to polish wafers, to planarize patterned surfaces, and to smooth surface roughness. The Cytoviva website has great information about the instrument including manuals, user forums, and tutorial videos. SOP- Sub-micron metal patterning on polymer substrates using nitride nanostencil A process flow of resist-free nanostencil lithography technique that allows sub-micron metal patterningon a polymer substrate is established. Ellipsometry detects the phase change in polarized light as it reflects from or transmits through samples. stanford. This is an evolving project, so if you have any helpful suggestions, we welcome them! The SPTS uetch vapor system uses anhydrous HF and ethanol at reduced pressure and 45C to etch isotropically sacrificial silicon oxide layers, primarily to release silicon microstructures in MEMS devices. Hot pots available. Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom) SNF Cleanroom Paul G Allen L107 . We want users to have a basic understanding of SEM components and basic operation before a more detailed training session, so were asking them to shadow another user on the SEM-Merlin for the first 30 minutes of operation or be qualified on a SNSF SEM. Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma at ambient temperature. Fumehood 1 is currently our only flexible fumehood space available in Room 155. Allen and Allen Annex buildings: SNF staff This furnace will be shut down from 8/21/23 - 8/23/23 and the final shutdown will be on 3/1/24. The training requirement for each of the labs is summarized below. ) continually improve safety by identifying, analyzing, and responding to safety concerns. The Oxford III-V Etcher is currently approved to etch GaAs, InGaAs, InAs, InP, InGaAsP, GaP and Si only. SNF Cleanroom Paul G Allen L107 : Manual development of resist in beakers and Headway (manual resist spinner). Our Values: We support Stanford’s research and education mission. The Woollam tool uses ellipsometry to characterize thin films. Become a member of SNF. Feb 1, 2024 · Today, SNF is part of nano@stanford, comprised of four shared labs on the Stanford campus, and serving as part of NSF's National Nanotechnology Coordinating Infrastructure. It would be best to find someone who has used the system often. stanford Drying samples in the SNF is often done by using an N2 gun or by using an SRD (Spin Rinse Dryer) near the wet benches. NEMO Area: SNF: Photolithography Please send an email to all 1. SNF Cleanroom Paul G Allen L107 : Acid or Base Wet Etching, Piranha Cleaning: Wet Bench Flexcorr 2 wbflexcorr-2 : Manual wet etching of non-standard materials using only SNF approved acids or bases. For detailed technical info, please refer to the Labuser Guide. Name. (650)736-4898. 3 Equipment Training Shadowing is required. nano@stanford is supported by the National Science Foundation (NSF) as part of the National Nanotechnology Coordinated Infrastructure (NNCI) under award ECCS-2026822 . 1, 2024, SNF switched from Badger to NEMO. Go to "nano@stanford" and then to the "Dry Etching" section for the three videos on plasma etching principles and to "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment. edu if you require the building tour only. Today, SNF is comprised of the following fabrication spaces co-located in the Paul G. NEMO Area: SNF: Photolithography Please send an email to all Feb 1, 2024 · NEMO LMS. The Bonder module includes a Megasonic Clean station for ultrasonic cleaning of wafers before alignment. Parking is also available in the Roble Field garage at Via Ortega and Santa Teresa streets. The Electronic Visions system is comprised of the precision optical 620 Aligner and the 501 Wafer Bonder. Lab fees incurred by consultants are billed directly to their customers' accounts. Here, labmembers and prospective labmembers will find quick links to administrative and logistics info for working in the lab. Sara Ostrowski. We are continually improving things as we go: our goal is a community web resource for fabrication in general as well as details about working in our lab. It offers a modular design and can be easily reconfigured for future applications, making it the premier choice when maximum technological versatility and fast process implementation is key. "All Litho" class is required before training on any of the lithography tools. We are supported by NSF through the National Nanotechnology Infrastructure Network . The SAMCO etcher is a multifunctional etcher that can operate in either the RIE, plasma etch or Downstream plasma modes. Feb 1, 2024 · Independent consultants have long been important members of the SNF community, providing processing services to researchers from Stanford and beyond. Nearest visitor parking is available in Parking Structure 2 ("Via Ortega Garage"). Feb 1, 2024 · When complete, email your Certificates of Completion to snf-access@stanford. The first part of the course will consist of a hands-on introduction to the techniques of micro and nanofabrication using Stanford’s shared nanotechnology research facilities, SNF and SNSF, complemented with field trips to local companies and other research centers to illustrate the many applications of nanotechnology, such The Oxford III-V Etcher (Ox-35) is an inductively-coupled plasma (ICP) reactive ion etcher (RIE), designed for etching III-V semiconductors. and around the globe. Note that you will need a current SUNet ID to log in using 2-step authentication (now required per security policies. The Stanford Nanofabrication Facility serves academic, industrial and governmental researchers across the U. Non-Stanford, US University academic institutions are subject to the "Non-Sponsored Receivables Rates: Affiliated Users/Waived Rate. Contact a qualified lab member of the tool to arrange to ‘shadow’. edu to sign up for the All Litho class. Alveole Primo allows precise and rapid way to pattern proteins. The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher. Stanford Nano Shared Facilities SNSF provides shared scientific instrumentation, laboratory facilities, and expert staff support to enable multidisciplinary research and educate tomorrow’s scientists and engineers. edu or snf-promcommittee@lists. Dry and wet oxidation. We plan to make this page a great starting point for exploring the processes that are available in our labs. 4 Committees and Groups; 1. 1 Labmembership. The unique single monochromator design of the V-670 requires fewer mirrors to provide a higher throughput resulting in a better signal-to-noise ratio over the entire spectral range. ) provide the tools and resources for safe lab use; and c. The Cytoviva is a hyperspectral imaging instrument which allows spectral mapping of individual pixels on a microscope image. Lab User Guide. The Gasonics Aura Asher is an automated down stream microwave plasma system used for stripping photoresist of 4 inch wafers in the 'clean' cleanliness group. Please send an email to all-litho-training@lists. This tool uses UV laser (375nm) which is used to illuminate your pattern onto the substrate. There are 3 gases that are plumbed to the tool: Gas1: O2, Gas2: CF4, and Gas3: SF6. This side contains a transfer station that is used primarily for 2D material transfer. It will be permanently removed from the cleanroom and replaced by a new Tystar furnace in March 2024. Please refer to our All About NEMO site for all your NEMO questions and needs. For all your tool enables, reservations, and purchases. Mar 16, 2021 · New training instructions and educational materials being developed by nano@stanford are available on Stanford’s online edX-based platform. (650)725-0293. The S-neox system from Sensofar is a 3D optical profiler combining confocal, interferometry, and focus variation techniques in the same sensor head without any moving parts. The Biologic Poteniostat can be used for: - Renewable energy sources - Fundamental electrochemistry - Sensors - Corrosion - Electrolysis/anodizing - Coatings Our system has - Ultra low current: range down to 1 pA - Built-in EIS analyser: 10 μHz to 7 MHz - Potential resolution: 1 μV - Current ranges: 1 A to 10 nA (standard) - Current resolution: 760 fA (standard) The Stanford Nanofabrication Facility is located in the Paul G. The micro compounder allows up to 15ml of material to be melted and mixed thoroughly. edu to sign up for The Tencor Alphastep 500 is a stylus-based surface profiler to measure step heights of surfaces. Allen Building. Stanford University. About Labmembership: SNF is open to anyone from any academic, government, private or industrial organization for any type of research and development activity allowed by the following: All must abide by the SNF Code of Conduct and non-Stanford researchers must also abide by terms of the Service Center Agreement Forms. Methane, hydrogen and ethanol are available as process gases and thus provide versatility for both SWCNT growth as well as vertical forest growth. Feb 1, 2024 · NEMO LMS. edu. It is used for mixing and deaeration- some common uses are for PDMS mixing and battery slurry generation. We are one of the four labs that are part of nano@stanford , under the NSF National Nanotechnology Coordinated Infrastructure program. . 5x17. Lab User Guide Lab Organization, Location, and NEMO Information Please send an email to all-litho-training@lists. Allen Building on the Stanford main campus. edu; View the training videos: Building Safety Tour (9:42) Cleanroom Safety Tour (12:49) SNF Safety Training, (22:27 min) Gowning (2:00) Read and understand the lab policies: SNF Lab Manual; Cleanliness Groups; New Process/Material Requests; Complete the safety test We would like to show you a description here but the site won’t allow us. Lesker2 is a load locked single wafer metal sputter providing semi-clean processing options for semi-clean compatible materials. SNSF’s purpose is to provide shared scientific instrumentation, laboratory facilities, and expert staff support to enable multidisciplinary research and educate tomorrow The Stanford Nanofabrication Facility (SNF) Originally built as an electronics fabrication foundry, our facility has evolved and adapted with the needs of our research community. NEMO FAQ's | Nanofabrication Facility. As a non-profit research organization, production of devices in our facilities for commercial sale is prohibited. (snf-promcommittee at lists dot stanford dot edu) Location, and NEMO Information. The Lakeshore 8404 Hall measurement tool is installed in Allen 151 at SNF and we have demonstrated the functionality by AlGaN/GaN HEMT, diamond and 2D material samples. The Formlabs 3D printer cleaner is currently located here. Teflon coated metal tweezers cleaning. Jun 14, 2023 · nejad@stanford. S. Sinton lifetime tester WCT-100 is used to test minority carrier lifetime at a specified minority carrier density. Allen Building, Room 158 420 Via Ortega Stanford, CA 94305-4114 The Plasma-Therm Shuttlelock PECVD (CCP-Dep) system is used for depositing low-stress silicon nitride, silicon dioxide, amorphous and silicon carbide, and silicon oxynitride layers on 4 inch wafers. g. With a Keysight B1500A Semiconductor Device Analyzer, it is capable of both I-V (Current-Voltage) and C-V (Capacitance-Voltage) measurements. ) Some of the features we think you'll like: For more information about nano@stanford, please view our YouTube video below or email us at nnci_access@lists. What about Badger? What are my current charges? Lab Communication; Personal Storage; Safety Training; SNF Lab manual. 2 Lab Fees; 1. SNF approved developers (acid or base). Feb 1, 2024 · SNF’s responsibility is to a. Internal Labmembers are students, employees and other researchers with appointments at Stanford or SLAC. We will help labmembers coordinate with service providers where it NEMO is here! On Feb,. Types of Labmembership. Please contact Michelle if you would like to use this space for your processing. Yes, SNF is hiring! Job description and application process can be found on the Stanford Jobs site, position #101275. edu> in advance Lab Organization, Location, and NEMO Information Lab Organization: Full Facility Name: Stanford Nanofabrication Facility. " This glovebox is the right side of a two sided glovebox that is located in SNF Exfab Mavericks (Room 155). If you have questions about your process or would like to get trained, please contact primary trainer. This Xplore MCHT15 is a two part system. This position will manage the MOCVD lab as well as support researchers in the cleanroom. Flexible: SNF Cleanroom Paul G Allen L107 This hotplate is primarily used for PDMS processing and is located in the hood with the Thinky mixer. e. CVD-Nanotube The First Nano CVD furnace is dedicated to carbon nanotube synthesis and can accommodate multiple pieces or a 4" wafer. Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom) Location: SNF Cleanroom Paul G Allen L107 . XeF2 is a vapor phase etch, which exhibits nearly very high selectivity of silicon to photo-resist, silicon dioxide, silicon nitride and aluminum. Contact the primary trainer. edu; Service Providers: There are also service providers who can support oxidation and film deposition on in-process substrates. Please send the following information - substrate size and type, types of resists, resist thickness(es), minimum feature size, substrate relief (i. How to Join: Feb 1, 2024 · SNF works with a number of suppliers and may be able to help with bulk discounts. NEMO Area: SNF: Photolithography Please send an email to all For more than 300nm deposition, please contact Graham Ewing<grahamj. The eight gun magnetron Lesker is classified as semi-clean and provides non-directional thin film (< 1 um) (From the Jasco website). The POLI-400L CMP (Chemical Mechanical Polishing) system is designed to polish standard 4” wafers (no pieces). Using 365nm near-UV light this stepper is capable of a minimum feature size of 450nm and alignment between lithographic layers of 90nm. If you would like to use it for any purpose, please contact the primary trainer. The maximum dimensions of a part that it can make is about 14. NEMO Area: nSiL: L104 Stinson Please send an email to all-litho-training@lists. Feb 1, 2024 · Phone. edu> in advance Lab Organization, Location, and NEMO Information Lab Organization: The Stanford Nanofabrication Facility serves academic, industrial, and governmental researchers across the U. NEMO Area: SNF: Photolithography Please send an email to all Feb 1, 2024 · The Stanford Nanofabrication Facility has welcomed all researchers, external to Stanford as well as within, since 1994, and expanding on our foundation in electronics to provide fabrication resources to researchers in all disciplines. Wet bench to remove resist using SRS-100 or PRS1000. Oct 14, 2022 · Welcome to the SNF Process page. It is a self assembling monolayers (SAMs)-based configuration of a Savannah S200 from Cambridge Nanotech with 1 SAMs delivery port and 4 standard atomic layer deposition (ALD) lines. It is a planar etch system with 30kHz generator and upto 500W. Go to Online Nano Course Login to log in directly to the course. A stylus is placed in contact with, and then gently dragged along the surface of the substrate. Lab Organization: Stanford Nanofabrication Facility (SNF) Form2 3D printer is a stereolithography (SLA) 3D printer. 3 Lab Resources; 1. SNF provides a comprehensive array of about 100 different fabrication tools including: Photolithography systems (e. This oven is used primarily for PDMS processing. By default, the full building and cleanroom tours are scheduled for all new labmembers; make sure to inform snf-access@stanford. Online Course for general information about the online training. Nanoscribe Photonics Professional GT is a versatile tool to write 3D micro and nano structures for applications in micro-fluidics, optics, bio-engineering, MEMS structures etc. The Stanford Nano Shared Facilities (SNSF) is a group of service centers, Nanofabrication, Electron & Ion Microscopy, X-ray & Surface Analysis and Soft & Hybrid Materials. M icromanipulator6000 is a four-probe electrical test station. Almost arbitrary complex 3D shapes (importable in STL file format) can be fabricated in the size range of a few hundred nanometers with a 2 photon polymerization or exposure process. FINEPLACER® lambda is a flexible sub-micron die-bonder for precision die attach and advanced chip packaging. Associate Director of nano@stanford - AFM. tj qo bx fm xg mw kr qs nm zo